SHOWERHEAD AND SEMICONDUCTOR PROCESSING APPARATUS HAVING SAME

摘要

A showerhead and a semiconductor processing apparatus having the same are provided to efficiently inject the gas by equipping the gas spreading space and the gas flow path for the jet. A shower head(40) sprays the gas supplied from gas supply pipes(51,52,53) within the process space. The shower head comprises a gas flow path part supplying the gas through flow channels(211,221) within the process space and a gas diffusion part which diffuses and supplies the gas in order to smoothly supply the gas within the process space according to the property of the supplied gas. Tube connection parts connecting gas flow path parts(210, 220) are installed at a diffusion space(311).