APPARATUS FOR FORMING A NANO PATTERN AND FABRICATION METHOD A NANO PATTERN USING THE SAME
摘要
<p>An apparatus for forming nano pattern with low cost and a manufacturing method thereof are provided to manufacture a minute pattern having uniformity during a short time by using advantage of a beam enlargement method and a beam scan method. An apparatus for forming nano pattern includes a laser(101) generating a beam(110). The beam coming from the laser is separated into two beams having the same intensity by a beam splitter(104). Two beam separated from the beam splitter is reflected toward a substrate by variable mirrors(105a, 105b). A beam enlargement part(106a, 106b) is installed in a route of two beams. A beam blocking part passes a specific region expanded through the beam enlargement part, and blocks the other region. A substrate transfer device(108) is positioned in a bottom of the substrate.</p>
申请公布号
KR100881140(B1)
申请公布日期
2009.02.02
申请号
KR20070080268
申请日期
2007.08.09
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
PARK, MOO YOUN;KIM, JIN HA;HWANG, SOO RYONG;JUNG, IL HYUNG;LEE, JONG HO