发明名称 Megavoltage scatter radiation measurement using beam stop array
摘要 A system may include emission of megavoltage radiation from a megavoltage radiation source, acquisition of a first image using an imaging device while first megavoltage radiation is emitted from the megavoltage radiation source and while a plurality of elements is between the megavoltage radiation source and the imaging device, and determination of an amount of scatter radiation based at least on areas of the acquired image corresponding to the plurality of elements. In some aspects, at least one of the plurality of elements is substantially pointed toward a focal spot of the megavoltage radiation source.
申请公布号 US7486773(B2) 申请公布日期 2009.02.03
申请号 US20060431490 申请日期 2006.05.09
申请人 SIEMENS MEDICAL SOLUTIONS USA, INC. 发明人 MALTZ JONATHAN S.;ZHENG ZIRAO;SVATOS MICHELLE M.
分类号 G01B15/02;G01N23/20;G01N23/201;H01J37/295;H01L27/146 主分类号 G01B15/02
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