| 发明名称 |
METHODS FOR IN-SITU GENERATION OF REACTIVE ETCH AND GROWTH SPECIE IN FILM FORMATION PROCESSES |
| 摘要 |
Methods and apparatus are disclosed for the formation and utilization of metastable specie in a reaction chamber for processing substrates. The metastable specie may be used for etching the surface of substrates in situ, deposition processes during processing of the substrate. |
| 申请公布号 |
KR20090012206(A) |
申请公布日期 |
2009.02.02 |
| 申请号 |
KR20087020262 |
申请日期 |
2007.01.09 |
| 申请人 |
APPLIED MATERIALS INC. |
发明人 |
KUPPURAO SATHEESH;CARLSON DAVID K.;BECKFORD HOWARD;SANCHEZ ERROL |
| 分类号 |
H01L21/302;H01L21/20;H01L21/306 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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