| 摘要 |
<p>A chemical solution evaporation tank and chemical solution processing system is provided to suppress the gap of the concentration of the vaporized process gas by installing a gas path to make the pressure between each vaporization chamber uniform. A tank body(3C) is closely divided by the partition member(31-33) in the traverse direction, and a plurality of vaporization chamber(4A,4B,4C,4D) is formed. A drug solution passageway is installed at each partition member in order to circulate the drug solution, and it maintains pressure between each vaporization chamber installed at the partition member. A gas supply unit for the evaporation is installed at each vaporization chamber and supplies the gas for the evaporation to the drug solution within the vaporization chamber, and generates a process gas on the surface of the drug solution.</p> |
