| 摘要 |
A plasma reactor including inductively coupled plasma source in which a heater is installed is provided to improve processing yield by controlling temperature related in internal contamination and reducing contamination inside the reactor. An inductively coupled plasma source comprises a body(12), an inductively coupled plasma source(30), a heater electrode(34), a heater driving circuit(40). The body has a plasma induced discharge area. The inductively coupled plasma source forms an induced coupled plasma inside the reactor body. The heater electrode is installed at the inductively coupled plasma source in order to control inner temperature of the reactor body. The heater driving circuit supplies power to the heater electrode and controls temperature inside the reactor body.
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