| 摘要 |
<p>A method for preparing ultra-pure organometallic compound useful for chemical vapor deposition process is provided to accomplish the compound preparation by employing the microchannel apparatus in the synthesis which reacts metal halide with alkyating agent. The organometallic compound having the minimum purity required for the chemical vapor deposition is prepared by reacting metal salt such as metal halide with alkyating agent within the microchannel apparatus in the presence of solvent, and optionally purifying the alkylating agent, wherein the purity of the compound is the minimum 99.99%.</p> |
