| 摘要 |
An etching apparatus includes: an etching chamber; a piping unit disposed in an upper portion of the etching chamber and including a plurality of nozzles via which an etchant is sprayed; a substrate mask disposed below the piping unit; and a transfer unit disposed below the substrate mask and used to transfer a substrate. The substrate mask interposed between the piping unit including the nozzles and the substrate has a mesh structure or a plurality of holes or slits. Thus, the generation of microbubbles can be prevented during a wet etching process so that a thin layer formed on the substrate can be etched at a uniform etch rate. Also, a lift unit having a fixing unit may be disposed on a lateral surface of the substrate mask. The lift unit moves the substrate mask up and down so as to obtain a uniform etch rate.
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