发明名称 MANUFACTURING OF METHOD NITRIDE SEMICONDUCTOR LASER DEVICE AND NITRIDE SEMICONDUCTOR LASER DEVICE
摘要 A method for manufacturing a nitride semiconductor laser device and the nitride semiconductor laser device are provided to improve a current voltage characteristic by preventing the lowering of a rising voltage. An element region includes a resonator comprised on a substrate. An island shape layer(13a) is separated from the element region. An exposure region(11a) divides the element region and the island shape layer. A laminate includes an auxiliary groove(15) formed along the resonator surface. The resonator surface is obtained by dividing the laminate and the substrate along the auxiliary groove.
申请公布号 KR20090009124(A) 申请公布日期 2009.01.22
申请号 KR20080069472 申请日期 2008.07.17
申请人 NICHIA CORPORATION 发明人 MASUI SHINGO
分类号 H01S5/323 主分类号 H01S5/323
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