发明名称 SOURCE-DRAIN ELECTRODE, THIN FILM TRANSISTOR SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technology capable of exerting excellent TFT characteristics even if a lower barrier metal layer is omitted and directly and definitely connecting source-drain wires to a semiconductor layer of the TFT. SOLUTION: A source drain electrode 34 is composed of a nitrogen containing layer and a thin film of pure Al or Al alloy. The nitrogen in the nitrogen containing layer is coupled with Si in the semiconductor layer 33 of the thin film transistor, and a thin film of pure Al or Al alloy is connected to the semiconductor layer 33 of the thin film transistor through the nitrogen containing layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009016862(A) 申请公布日期 2009.01.22
申请号 JP20080215568 申请日期 2008.08.25
申请人 KOBE STEEL LTD 发明人 KAWAKAMI NOBUYUKI;KUGIMIYA TOSHIHIRO;GOTO YASUSHI;FUKU KATSUFUMI;MIKI AYA
分类号 H01L29/786;G09F9/00;G09F9/30;H01L21/28;H01L21/336;H01L29/417 主分类号 H01L29/786
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