发明名称 |
SOURCE-DRAIN ELECTRODE, THIN FILM TRANSISTOR SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of exerting excellent TFT characteristics even if a lower barrier metal layer is omitted and directly and definitely connecting source-drain wires to a semiconductor layer of the TFT. SOLUTION: A source drain electrode 34 is composed of a nitrogen containing layer and a thin film of pure Al or Al alloy. The nitrogen in the nitrogen containing layer is coupled with Si in the semiconductor layer 33 of the thin film transistor, and a thin film of pure Al or Al alloy is connected to the semiconductor layer 33 of the thin film transistor through the nitrogen containing layer. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009016862(A) |
申请公布日期 |
2009.01.22 |
申请号 |
JP20080215568 |
申请日期 |
2008.08.25 |
申请人 |
KOBE STEEL LTD |
发明人 |
KAWAKAMI NOBUYUKI;KUGIMIYA TOSHIHIRO;GOTO YASUSHI;FUKU KATSUFUMI;MIKI AYA |
分类号 |
H01L29/786;G09F9/00;G09F9/30;H01L21/28;H01L21/336;H01L29/417 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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