| 摘要 |
PROBLEM TO BE SOLVED: To maintain a cleanliness factor near an inspecting position high in the configuration of relatively moving a detector to a substrate. SOLUTION: In the substrate inspecting apparatus 1, an inspection part 4 for inspecting a substrate W is arranged inside the laminar flow of clean fluid formed inside a case 2. The inspection part 4 is provided with an inspection unit 13 swingably attached to the inspecting position P2, and it is made possible to optically observe the surface of the substrate carried to the inspecting position P2. Inside the case 2, a first laminar flow forming apparatus 71 and a second laminar flow forming apparatus 72 so that air flow at the inspecting position P2 is not obstructed or disturbed by the presence of the detection unit 13. When the air flow is guided to the inspecting position P2 in the first laminar flow forming apparatus 71, the second laminar flow forming apparatus 72 is arranged almost in parallel with the air flow. COPYRIGHT: (C)2009,JPO&INPIT
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