发明名称 INSPECTION METHOD AND DEVICE USING ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To provide an inspection method and device using electron beam in which inspection can be made at a higher speed. SOLUTION: Electron beam generated by an electron beam source is focused on a test piece by an object lens, and the test piece is scanned by the electron beam, and the electron bean is deflected so that a charged particle can be generated from the test piece, and the test piece is moved continuously while scanning and a focusing distance of the object lens is rectified by measuring a height of the test piece while the test piece is moving, and the charged particle generated from the test piece is detected from between the object lens and the test piece by a charged particle detecting unit and is converted into an electric signal, and the electric signal is memorized as an image signal and an image comparison is conducted by using the memorized image signal and a test piece defect is detected. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009016360(A) 申请公布日期 2009.01.22
申请号 JP20080269292 申请日期 2008.10.20
申请人 HITACHI LTD 发明人 IWABUCHI HIROKO;TODOKORO HIDEO;MORI HIROYOSHI;SATO MITSUGI;USAMI YASUTSUGU;ICHIHASHI MIKIO;FUKUHARA SATORU;SHINADA HIROYUKI;KANEKO YUTAKA;SUGIYAMA KATSUYA;TAKATO ATSUKO;TOOYAMA HIROSHI
分类号 H01J37/28;H01J37/147 主分类号 H01J37/28
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