发明名称 |
Verfahren zur Abscheidung eines Materials auf einem Substratwafer |
摘要 |
A wafer (1) is prepared, and has a growth surface (4) for later material deposition. A thermal radiation absorption layer (2) is applied to the rear (5), opposite the growth surface. The substrate is heated to the deposition temperature, and the material (3) is deposited onto the growth surface of the wafer using MOVPE (metal organic vapor phase epitaxy). |
申请公布号 |
DE10250915(B4) |
申请公布日期 |
2009.01.22 |
申请号 |
DE2002150915 |
申请日期 |
2002.10.31 |
申请人 |
OSRAM OPTO SEMICONDUCTORS GMBH |
发明人 |
HAERLE, VOLKER;HAHN, BERTHOLD;BADER, STEFAN;LUGAUER, HANS-JUERGEN |
分类号 |
H01L21/205;C30B23/00;C30B25/02;C30B25/10;C30B25/12;C30B29/38;H01L21/20;H01L21/324 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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