A DUAL-STAGE SWITCHING SYSTEM FOR A LITHOGRAPHIC MACHINE

摘要

A dual-stage switching system for a lithographic machine comprises a silicon chip stage (10) operating in an exposure workstation (6) and another silicon chip stage (12) operating in a pre-processing workstation (7). The silicon chip stages (10,12) are provided on a base (1), four dual-freedom drive units (21,22,23,24) capable of moving along X direction and Y direction are provided on the edge of the base (1), and the silicon chip stages (10,12) are disposed in a space surrounded by the four dual-freedom drive units (21,22,23,24) and suspended on an upper surface of the base (1) by air bearings. Each of he four dual-freedom drive units (21;22;23;24) includes upper, lower linear guides and a guide sleeve, and the upper linear guide and lower linear guide are installed in the guide sleeve in the form of a cross. Two adjacent dual-freedom drive units [21,22; 22,23; 23,24; 21,24) cooperatively drive the silicon chip stage (10; 12), thereby achieving the movement along the X direction and Y direction.