METHOD OF ADJUSTING POSITION DETECTION DEVICE, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an adjustment method capable of reducing detection errors by accurately adjusting each of coma aberration and optical axis displacement of an optical system independently of each other, in a position detection device of an alignment detection system or the like.

SOLUTION: The method includes a first optical member and a second optical member allowing positions thereof to be changed. The method has the steps of: setting a plurality of positions different from one another as positions used for positioning the first optical member in a direction vertical to an optical axis; detecting light entering into a photoelectric conversion element while relatively moving an inspection object in the direction of the optical axis for each of the plurality positions; calculating an evaluation value showing asymmetric nature of a detection signal of light detected in the detection step; identifying the position of the inspection object in the direction of the optical axis where the evaluation value calculated in the calculation step is insensitive; and adjusting the position of the second optical member in the direction vertical to the optical axis based on the evaluation value.

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