发明名称 SEMICONDUCTOR MEMORY
摘要 PROBLEM TO BE SOLVED: To improve reliability on a word line by a novel contact hole structure. SOLUTION: A semiconductor memory according to an embodiment of the present invention has a memory cell array area having memory cells, a word line contact area adjacent to the memory cell array area, word lines disposed across the memory cell array area and word line contact area, contact holes CS1(n-1) provided on word lines 17 and 18 in the word line contact area, and a word line driver connected to the word lines 17 and 18 through the contact holes CS1(n-1). Further, the size of each of the contact holes CS1(n-1) is larger than widths of the word lines 17 and 18 and lowest portions of the contact holes CS1(n-1) are lower than top surfaces of the word lines 17 and 18 and higher than reverse surfaces thereof. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009016444(A) 申请公布日期 2009.01.22
申请号 JP20070174280 申请日期 2007.07.02
申请人 TOSHIBA CORP 发明人 KATO TOUSHI;NOGUCHI MITSUHIRO
分类号 H01L27/10;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L27/10
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