发明名称 DIAMINE COMPOUND, POLYAMIC ACID, SOLUBLE POLYIMIDE, WETTABILITY CHANGEABLE FILM AND ELECTRODE PRODUCED THEREFROM
摘要 PROBLEM TO BE SOLVED: To provide a polyamic acid used as a raw material for an organic semiconductor material capable of changing the surface free energy of a film with radiation in a reduced amount of irradiation energy when forming a line for electrodes on a film by irradiating with energy rays to change the surface free energy of the film, coating the changed portion with a sliver nanoink and sintering. SOLUTION: The polyamic acid is a copolymer of a diamine compound and an acid dianhydride wherein the diamine compound is a substituent-containing phenol ester of a 1,3-diamino-benzene-5-carboxylic acid in which the substituent includes a 2,3,4-trialkoxy phenylene. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009013342(A) 申请公布日期 2009.01.22
申请号 JP20070178703 申请日期 2007.07.06
申请人 RICOH CO LTD 发明人 TANO TAKANORI;SUZUKI YUKIE;TSUDA YUSUKE
分类号 C08G73/10;C07C229/60;H01L21/283;H01L21/288;H01L21/336;H01L29/786;H01L51/05;H01L51/30 主分类号 C08G73/10
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