发明名称 |
DIAMINE COMPOUND, POLYAMIC ACID, SOLUBLE POLYIMIDE, WETTABILITY CHANGEABLE FILM AND ELECTRODE PRODUCED THEREFROM |
摘要 |
PROBLEM TO BE SOLVED: To provide a polyamic acid used as a raw material for an organic semiconductor material capable of changing the surface free energy of a film with radiation in a reduced amount of irradiation energy when forming a line for electrodes on a film by irradiating with energy rays to change the surface free energy of the film, coating the changed portion with a sliver nanoink and sintering. SOLUTION: The polyamic acid is a copolymer of a diamine compound and an acid dianhydride wherein the diamine compound is a substituent-containing phenol ester of a 1,3-diamino-benzene-5-carboxylic acid in which the substituent includes a 2,3,4-trialkoxy phenylene. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009013342(A) |
申请公布日期 |
2009.01.22 |
申请号 |
JP20070178703 |
申请日期 |
2007.07.06 |
申请人 |
RICOH CO LTD |
发明人 |
TANO TAKANORI;SUZUKI YUKIE;TSUDA YUSUKE |
分类号 |
C08G73/10;C07C229/60;H01L21/283;H01L21/288;H01L21/336;H01L29/786;H01L51/05;H01L51/30 |
主分类号 |
C08G73/10 |
代理机构 |
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