发明名称 Chemical solution vaporizing tank and chemical solution treating system
摘要 An object is to suppress differences in concentration between processing gases supplied to a plurality of works in a chemical solution vaporizing tank. The chemical solution vaporizing tank includes a tank body having a plurality of vaporizing chambers formed by laterally and airtightly partitioning an internal space of the tank body, a chemical solution passage located under a liquid level in each vaporizing chamber and formed at each partition member for passing the chemical solution between the vaporizing chambers, and a gas passage located above the liquid level in each vaporizing chamber and formed at the partition member to communicate the vaporizing chambers with each other for uniformizing pressures in the respective vaporizing chambers. A quantity of the channel layer in each vaporizing chamber is controlled by managing, e.g., the liquid level.
申请公布号 US2009020072(A1) 申请公布日期 2009.01.22
申请号 US20080216992 申请日期 2008.07.14
申请人 TOKYO ELECTRON LIMITED 发明人 MIZUNAGA KOUICHI;KUDOH HIROYUKI;OOSHIMA KAZUHIKO
分类号 C23C16/00;B05C11/10 主分类号 C23C16/00
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