| 摘要 |
The present invention provides systems, methods, and apparatus for processing a lot of substrates in a lithography track system with an integrate metrology sensor. The invention includes performing a coating process on substrates; transferring the substrates to a stepper for alignment and exposure; transferring the substrates to a post-exposure bake chamber for bake; and performing metrology on the substrates in the lithography track system. The invention may further include automatically reworking substrates in an integrated rework chamber within the lithography track system. Numerous other aspects are provided.
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