| 摘要 |
An atmospheric pressure plasma processing apparatus is provided to maximize adhesion between a PI-film layer and Ni-plating by forming a concavo-convex part in the PI-film layer by irradiating the ion to a PI(Polyimide) film layer. An atmospheric pressure plasma system includes a pair of electrodes(112,116) and a magnetic force generation unit(120). A pair of electrodes are erected. The magnetic force generation unit forms a concavo-convex part by irradiating the ion to the PI-film layer of the substrate by a magnetic field generated between the electrode and the substrate. |
