| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid recovery apparatus capable of excellent exposure processing by quickly and accurately measuring a flow rate of a liquid recovered by mixing a gas with the liquid, and reducing an effect due to leakage or intrusion of the liquid; and to provide an immersion lithography. <P>SOLUTION: In a line for mixingly recovering a gas (g) and a liquid (f), liquid recovery apparatus 20 and 21 for measuring a flow rate of only the liquid have recovery tubes 17 and 18 being one or more recovery lines for mixingly recovering the gas (g) and the liquid (f); a depressurization tank 22 is a depressurized vessel inserted with the recovery tubes 17 and 18; a liquid reception vessel 23 is arranged in the depressurization tank 22, and receives the liquid (f) discharged from the recovery line; drain piping 24 is connected to a bottom part of the liquid reception vessel 23; a flow rate sensor 26 being a flow rate detection part is arranged in an intermediate part of the piping 24, and measures the flow rate of the liquid (f); and at least part of a part of the piping 24 downstream of the flow rate sensor 26 is arranged above the flow rate sensor 26. <P>COPYRIGHT: (C)2009,JPO&INPIT |
