发明名称 Method for Delineation of Phase Change Memory Cell Via Film Resistivity Modification
摘要 A PCM cell structure comprises a lower electrode composed of a Phase Change Memory (PCM) layer and a conductive encapsulating upper electrode layer. The PCM is protected from damage by a conductive encapsulating layer. Electrical isolation between adjacent cells is provided by modifying the conductivity of the PCM layer and the conductive encapsulating upper electrode layer subsequent to deposition.
申请公布号 US2009020739(A1) 申请公布日期 2009.01.22
申请号 US20070781239 申请日期 2007.07.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ARNOLD JOHN CHRISTOPHER;CARMICHAEL TRICIA BREEN
分类号 H01L47/00;H01L21/00 主分类号 H01L47/00
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