发明名称 |
Beschichtungszusammensetzung für die Filmherstellung, Verfahren zur Herstellung der Zusammensetzung und Verfahren zur Filmherstellung |
摘要 |
<p>A composition for film formation having low dielectric constant, excellent adhesion to a silica film and excellent adhesion to an organic film, a method for preparing the composition, and a method for forming a silica film using the composition are disclosed. The composition for film formation comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one specific silane compound, and (B) an oxygen-containing organic solvent, wherein the content of the product of hydrolysis and condensation (A) is less than 5% by weight based on the weight of the composition. The composition can form a silica film having improved dielectric constant characteristics and storage stability, and also improved adhesion to other silica films and organic films.</p> |
申请公布号 |
DE602004011308(T2) |
申请公布日期 |
2009.01.22 |
申请号 |
DE20046011308T |
申请日期 |
2004.11.25 |
申请人 |
JSR CORP. |
发明人 |
AKIYAMA, MASAHIRO;SEKIGUCHI, MANABU;HATTORI, SEITARO;KOKUBO, TERUKAZU |
分类号 |
C08G77/08;C09D183/04;B05D7/24;C08G77/50;C09D5/25;C09D7/12;C09D183/02;C09D183/14;H01L21/312 |
主分类号 |
C08G77/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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