发明名称 |
METHOD FOR DETECTING SURFACE DEFECTS ON A SUBSTRATE AND DEVICE USING SAID METHOD |
摘要 |
<p>Method for detecting surface defects on a substrate and device using said method. This invention relates to a method for detecting surface defects, such as =slip line= type defects, on a substrate (2) designed to be used in electronics, optoelectronics or analogue, remarkable in that it comprises at least the following steps: -projection of a pattern composed of an alternation of light fringes and dark bands onto the substrate (2), so as to generate fringes reflected by the surface of the substrate (2), -relative displacement of the pattern and the substrate (2) along at least one direction, so as to displace the fringes of the pattern on the substrate (2), -acquisition of a sequence of at least three images of the pattern reflected by the substrate (2) by a sensor (8), the images corresponding to displacement of the fringes of the pattern, -determination of the gradient of the surface of the substrate (2) using displacements of fringes of the pattern, and -determination of the presence of a surface defect on the substrate (2) using variations in the gradient of the surface of the substrate (2). Another purpose of the invention relates to a device using said method.</p> |
申请公布号 |
WO2008116917(A8) |
申请公布日期 |
2009.01.22 |
申请号 |
WO2008EP53663 |
申请日期 |
2008.03.27 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;ALTATECH SEMICONDUCTOR;MOULIN, CECILE;MORITZ, SOPHIE;GASTALDO, PHILIPPE;BERGER, FRANCOIS;DELCARRI, JEAN-LUC;BELIN, PATRICE |
发明人 |
MOULIN, CECILE;MORITZ, SOPHIE;GASTALDO, PHILIPPE;BERGER, FRANCOIS;DELCARRI, JEAN-LUC;BELIN, PATRICE |
分类号 |
G01N21/95;G01B11/25;H01L21/66 |
主分类号 |
G01N21/95 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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