| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition excellent in shape retention function as a resin spacer and excellent also in developability, and a resin spacer film using the same. <P>SOLUTION: The resin composition is used as a resin spacer for forming a space between a substrate and a semiconductor element. The resin composition includes an alkali-soluble resin, a photopolymerizing resin, a photopolymerization initiator, and a filler in particle state. The average particle diameter of the filler is 0.05-0.35 μm, and the content of the filler is 1-40 wt.%. The resin spacer film is composed of the resin composition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
