| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce an exposure processing time by reducing the replacement time and alignment time required for a mask in an exposure device. <P>SOLUTION: The exposure device includes: an optical unit 1 for exposure; a mask changer 2 loaded with a mask stage to which a mask is fixed, and moving the mask stage to confront the optical unit 1; and a mask carrying means 17 for carrying in and out the mask to the mask changer. The mask carrying means has a plurality of mask carrying means 17, 17a adapted to carry out another mask while one mask is carried in, and the mask changer 2 has a mechanism in which a plurality of mask stages 7-9 to which masks 3-5 are respectively fixed at least in a line and moved in the direction of the line. The plurality of mask stages 7-9 respectively include an alignment means (an alignment scope 14) for aligning the mask stages 7-9 with the respective masks 3-6. <P>COPYRIGHT: (C)2009,JPO&INPIT |
