| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high numerical aperture projecting system for projecting a high quality image on a semiconductor wafer by correcting monochromatic aberration and chromatic aberration. <P>SOLUTION: The projecting system includes a beam splitter, reticle, a reticle optical group arranged between the reticle and the beam splitter, a concave mirror, a concave mirror optical group arranged between the concave mirror and the beam splitter, a fold mirror arranged between the beam splitter and the wafer, and a wafer optical group arranged between the beam splitter and the wafer. <P>COPYRIGHT: (C)2009,JPO&INPIT |
