| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for correcting a proximity effect correction rate which improve a rate of operation without suspending a charged particle beam drawing apparatus as much as possible even at error detection. <P>SOLUTION: The apparatus for correcting a proximity effect correction rate in the charged particle beam drawing apparatus that emits a charged particle beam onto a material surface to draw a given pattern on the material surface includes a pattern data receiving/controlling unit 20 which receives pattern data, a plurality of pattern developing boards 21 which receive output from the pattern data receiving/controlling unit 20 to develop a pattern, a developed pattern receiving/controlling unit 22 which receives output from the pattern developing board 21, a plurality of PEC calculation boards 23 which receive output from the developed pattern receiving/controlling unit 22 to carry out PEC calculation, and a PEC correction rate output control unit 24 which receives output from the PEC calculation boards 23 to output a PEC correction rate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
