发明名称 |
REAR-SURFACE IRRADIATION IMAGE SENSOR |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an image sensor formed in a rear-surface irradiation structure without necessity of metal reflecting layer separately, having improved photosensitivity and crosstalk on short wavelengths by controlling the depletion region of a photodiode. <P>SOLUTION: The image sensor includes the photodiode formed beneath the surface of a semiconductor substrate for producing photocharges by light irradiated from the rear surface of the semiconductor substrate, a reflecting gate which is formed on the photodiode at the upper part of the surface of the semiconductor substrate and to which a bias is applied for reflecting the light irradiated from the rear surface thereof to control the depletion region of the photodiode, and a transfer gate for transmitting the photocharges from the photodiode to the sense nodes of pixels. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009016826(A) |
申请公布日期 |
2009.01.22 |
申请号 |
JP20080167599 |
申请日期 |
2008.06.26 |
申请人 |
MAGNACHIP SEMICONDUCTOR LTD |
发明人 |
PARK SUNG HYUNG;LEE JU-IL |
分类号 |
H01L27/146;H01L27/14;H04N5/335;H04N5/369;H04N5/374 |
主分类号 |
H01L27/146 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|