发明名称 REAR-SURFACE IRRADIATION IMAGE SENSOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an image sensor formed in a rear-surface irradiation structure without necessity of metal reflecting layer separately, having improved photosensitivity and crosstalk on short wavelengths by controlling the depletion region of a photodiode. <P>SOLUTION: The image sensor includes the photodiode formed beneath the surface of a semiconductor substrate for producing photocharges by light irradiated from the rear surface of the semiconductor substrate, a reflecting gate which is formed on the photodiode at the upper part of the surface of the semiconductor substrate and to which a bias is applied for reflecting the light irradiated from the rear surface thereof to control the depletion region of the photodiode, and a transfer gate for transmitting the photocharges from the photodiode to the sense nodes of pixels. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009016826(A) 申请公布日期 2009.01.22
申请号 JP20080167599 申请日期 2008.06.26
申请人 MAGNACHIP SEMICONDUCTOR LTD 发明人 PARK SUNG HYUNG;LEE JU-IL
分类号 H01L27/146;H01L27/14;H04N5/335;H04N5/369;H04N5/374 主分类号 H01L27/146
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