| 摘要 |
<p>The method for managing UV irradiation for curing semiconductor substrate is provided to easily measure the decrease rate of illuminance by the contamination or deterioration of the transparent window glass by using other sensors. To cure the semiconductor substrate positioned within the chamber. Firstly, the UV light passes through the penetration glass window within the chamber. Next, the illuminance up stream of the penetration glass window and illuminance down stream of the penetration glass window are monitored (S2,S3). The output of the UV light is determined based on the monitored illuminances.</p> |
