发明名称 |
NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
<p>A resist composition, a novel compound used as an acid generator in the composition, a method for preparing the compound, and a formation method of resist pattern are provided to improve the safety of handling when the accumulation in the human body is considered. A resist composition comprises a base component whose solubility in an alkali developer is changed by the action of an acid; and an acid generator component which generates an acid by exposure and comprises an acid generator comprising a compound represented by the formula b1-1, wherein R1 is an aryl group or an alkyl group; R3 is H or an alkyl group; n1 is 0 or 1; A is a divalent group forming a 3-7-membered ring together with the combined sulfur atom; R2 is an aromatic group, a C1-C10 linear or branched alkyl group, or a C2-C10 linear or branched alkenyl group; n is 0 or 1; and Y1 is a C1-C4 alkylene group substituted or unsubstituted with F.</p> |
申请公布号 |
KR20090009113(A) |
申请公布日期 |
2009.01.22 |
申请号 |
KR20080068190 |
申请日期 |
2008.07.14 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HADA HIDEO;IWAI TAKESHI;SESHIMO TAKEHIRO;KAWAUE AKIYA;ISHIDUKA KEITA |
分类号 |
G03F7/004;G03F7/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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