METHOD FOR FABRICATING MONOLITHIC TWO-DIMENSIONAL NANOSTRUCTURES
摘要
<p>A patterning method for the creation of two-dimensional nanowire structures. Nanowire patterning methods are used with lithographical patterning approaches to form patterns in a layer of epoxy and resist material. These patterns are then transferred to an underlying thin film to produce a two-dimensional structure with desired characteristics.</p>
申请公布号
WO2009011975(A2)
申请公布日期
2009.01.22
申请号
WO2008US64439
申请日期
2008.05.21
申请人
CALIFORNIA INSTITUTE OF TECHNOLOGY;HEATH, JAMES R.;WANG, DUNWEI;BUNIMOVICH, YURI;BOUKAI, AKRAM
发明人
HEATH, JAMES R.;WANG, DUNWEI;BUNIMOVICH, YURI;BOUKAI, AKRAM