发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, having high sensitivity and excellent resolution/adhesion, a photosensitive element that uses the same, a method for producing a resist pattern and a method for producing a printed wiring board. <P>SOLUTION: The photosensitive resin composition comprises (A) a binder polymer, (B) a photopolymerizable monomer having an ethylenically unsaturated group, (C) a sensitizer represented by general formula (1), and (D) a photopolymerization initiator comprising a hexaarylbisimidazole, wherein R<SP>1</SP>and R<SP>2</SP>each denote a 1-20C alkyl group, or the like. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009014936(A) 申请公布日期 2009.01.22
申请号 JP20070175571 申请日期 2007.07.03
申请人 HITACHI CHEM CO LTD 发明人 ABE TAKUJI
分类号 G03F7/004;C08F2/50;G03F7/031;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/004
代理机构 代理人
主权项
地址