摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an oxide semiconductor containing Ga<SB>x</SB>In<SB>y</SB>Zn<SB>z</SB>oxide and a new material, and to provide a thin film transistor whose property is improved by adding the Ga<SB>x</SB>In<SB>y</SB>Zn<SB>z</SB>oxide and the new material as the channels of the thin film transistor, and its manufacturing method. <P>SOLUTION: The oxide semiconductor contains the Ga<SB>x</SB>In<SB>y</SB>Zn<SB>z</SB>oxide, and at least one material selected from groups consisting of a 4A-group material, oxide of the 4A-group material and a rare earth material. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |