发明名称 EXPOSURE ADJUSTMENT METHODS AND SYSTEMS
摘要 Exposure adjustment methods and systems are provided. First, image data including a plurality of pixels is obtained. A plurality of sample regions is set based on respective pixels. A parameter calculation is performed according to a plurality of specific pixels in the sample regions to obtain a plurality of groups of adjustment parameters. At least one of the pixels is performed with a parameter adjustment according to the adjustment parameters.
申请公布号 US2009021603(A1) 申请公布日期 2009.01.22
申请号 US20080171600 申请日期 2008.07.11
申请人 ASIA OPTICAL CO., INC. 发明人 HSIEH WEN-HUNG
分类号 H04N5/235;H04N3/14 主分类号 H04N5/235
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