发明名称 |
MEHRSCHICHTIGES POLIERKISSENMATERIAL FÜR CHEMISCH-MECHANISCHES POLIEREN |
摘要 |
The invention is directed to a polishing pad for chemical-mechanical polishing comprising an optically transmissive multi-layer polishing pad material, wherein the optically transmissive polishing pad material comprises two or more layers that are joined together without the use of an adhesive. |
申请公布号 |
DE602004018321(D1) |
申请公布日期 |
2009.01.22 |
申请号 |
DE20046018321T |
申请日期 |
2004.06.03 |
申请人 |
CABOT MICROELECTRONICS CORP. |
发明人 |
PRASAD, ABANESHWAR;SEVILLA, ROLAND K.;LACY, MICHAEL S. |
分类号 |
B24D3/32;B24B7/30;B24B37/20;B24D13/14 |
主分类号 |
B24D3/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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