发明名称 MEHRSCHICHTIGES POLIERKISSENMATERIAL FÜR CHEMISCH-MECHANISCHES POLIEREN
摘要 The invention is directed to a polishing pad for chemical-mechanical polishing comprising an optically transmissive multi-layer polishing pad material, wherein the optically transmissive polishing pad material comprises two or more layers that are joined together without the use of an adhesive.
申请公布号 DE602004018321(D1) 申请公布日期 2009.01.22
申请号 DE20046018321T 申请日期 2004.06.03
申请人 CABOT MICROELECTRONICS CORP. 发明人 PRASAD, ABANESHWAR;SEVILLA, ROLAND K.;LACY, MICHAEL S.
分类号 B24D3/32;B24B7/30;B24B37/20;B24D13/14 主分类号 B24D3/32
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