| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a polishing liquid composition which improves the polishing speed, decreases the surface defects such as scratches or pits, and improves the surface smoothness such as surface roughness (Ra) and waviness (Wa); a polishing method using the composition; and a magnetic disk substrate improved in surface smoothness such as surface roughness (Ra) and waviness (Wa) and a method for producing the same. SOLUTION: There are provided a polishing liquid composition [1] containing silica particles, water, and an Fe salt and/or an Al salt of a polyaminocarboxylic acid; a polishing liquid composition [2] containing an inorganic acid and/or an organic acid in addition to all the ingredients contained in composition [1]; a polishing method using composition [1] or [2]; a method for producing a magnetic disk substrate having a polishing step using composition [1] or [2]; and a magnetic disk substrate produced by using composition [1] or [2].</p> |
