| 摘要 |
a photosensitive resin composition from which an image coating film having high pattern surface water repellency, etc. even after a treatment with a plasma or the like and having insulating properties can be easily formed with high accuracy at a high throughput rate; and a cured film which is obtained from such positive photosensitive resin composition and is suitable for use as a film material for various displays. [MEANS FOR SOLVING PROBLEMS] The positive photosensitive resin composition comprises: ingredient (A) which is an alkali-soluble resin having a functional group enabling the resin to undergo a heat-crosslinking reaction and further having a functional group for a heat-curing reaction and for film curing, and having a number-average molecular weight of 2,000-30,000; ingredient (B) which is a siloxane compound having a number-average molecular weight of 100-2,000; ingredient (C) which is a compound having two or more vinyl ether groups per molecule; ingredient (D) which is a compound having two or more blocked isocyanate groups per molecule; ingredient (E) which is a photo-acid generator; and a solvent (F). |
