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发明名称
Pellicle frame
摘要
<p>The present invention is directed to provide a pellicle frame that causes little harm to the flatness of a photomask, even in the case where a pellicle is affixed after completion of the photomask.</p>
申请公布号
EP2017673(A1)
申请公布日期
2009.01.21
申请号
EP20080160683
申请日期
2008.07.18
申请人
SHIN-ETSU CHEMICAL CO., LTD.
发明人
SHIRASAKI, TORU
分类号
G03F1/64
主分类号
G03F1/64
代理机构
代理人
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地址
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