发明名称
摘要 PROBLEM TO BE SOLVED: To improve processing performance of a processing liquid and to improve an agitation property when immersing a photosensitive material in the processing liquid stored in a processing tank and processing it. SOLUTION: In a development tank 24 formed in the processing tank 22, a developer is circulated and agitated by the developer jetted from spray pipes 54 and 56. Then, since the spray pipe 54 provided on an upstream part in a PS plate carrying direction jets a large amount of the developer toward a carrying width direction, the developer flows on a surface of a PS plate along a width direction, a development processing to the PS plate is accelerated and a temperature change of the developer due to the temperature of the PS plate is prevented. Also, since the spray pipe 56 provided on a downstream part of the development tank jets the developer from a jetting hole 204 to a downstream side of the carrying direction, the developer of an almost uniform processing performance is supplied along the width direction of the PS plate and irregularities of finishing are prevented.
申请公布号 JP4213372(B2) 申请公布日期 2009.01.21
申请号 JP20010296494 申请日期 2001.09.27
申请人 发明人
分类号 G03F7/30;G03F7/00 主分类号 G03F7/30
代理机构 代理人
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