| 摘要 |
<p>A phase shift mask includes a substrate ( "SUB" ) including first and second transmissive regions (101, 102, 101', 102') alternately disposed, and absorbers (m) disposed on a surface of the substrate such that each absorber is sandwiched between the first and second transmissive regions. A phase shifter is defined by a difference between a surface height of the first transmissive region and a surface height of the second transmissive region. At least the first transmissive region (101, 101') among the first and second transmissive regions has a trench (T). An aperture portion (120) formed between opposite side walls of respective adjacent absorbers has a width that increases along a depth direction of the substrate. Each trench has a width that increases along the depth direction of the substrate.</p> |
