发明名称 E-beam vision system for monitoring and control
摘要 A method of characterizing an electron beam is described, comprising providing a system including an electron gun having a steering coil. A material having a surface is also provided. An electron beam from said electron gun is directed to said surface. The directing includes providing a first current to the steering coil to direct the electron beam to a first point on the surface and then providing a second current to the steering coil to direct the electron beam to a second point on the surface. An imaging system is mounted for viewing said surface. An image is collected based on light emitted from the surface because of the electron beam directed at the first point and the second point. A light intensity is determined at the first point and at the second point.
申请公布号 US7479632(B1) 申请公布日期 2009.01.20
申请号 US20060341154 申请日期 2006.01.27
申请人 TRUSTEES OF BOSTON UNIVERSITY;CYBER MATERIALS LLC 发明人 GEVELBER MICHAEL ALAN;BREWSTER ADAM SCOTT;VATTIAT BRIAN LOUIS
分类号 H01J37/30 主分类号 H01J37/30
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