发明名称 |
METHOD OF PRODUCING EXPOSED SUBSTRATE |
摘要 |
FIELD: physics. ^ SUBSTANCE: proposed invention describes the method of producing a resistive matrix furnished with at least two areas with different images thereon. The said method uses at least two photoresistor matching the images being generated. Note here that diffraction structures are made or written in the layer of the first and/or second photoresistor by means of exposure. ^ EFFECT: simpler exposure of resistors of resistors by means of various-type radiations to allow resistor layer thickness on various sites to match exposure parameters, if required. ^ 37 cl, 48 dwg |
申请公布号 |
RU2344455(C2) |
申请公布日期 |
2009.01.20 |
申请号 |
RU20050129549 |
申请日期 |
2004.02.24 |
申请人 |
GIZEKE UND DEVRIENT GMBKH |
发明人 |
VITTIKH KAULE |
分类号 |
G03F7/16;G03F7/00;G03F7/095;G03F7/20;G03H1/02 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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