| 发明名称 |
Method and apparatus of model-based photomask synthesis |
| 摘要 |
An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said photolithographic mask function to reduce the figure of demerit.
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| 申请公布号 |
US7480891(B2) |
申请公布日期 |
2009.01.20 |
| 申请号 |
US20050203505 |
申请日期 |
2005.08.13 |
| 申请人 |
CADENCE DESIGN SYSTEMS, INC. |
发明人 |
SEZGINER ABDURRAHMAN |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
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