| 摘要 |
A batch type vacuum deposition apparatus capable of improving sputtering efficiency and deposition method using the same are provided to obtain high quality product by grafting evaporation and a magnetron sputtering method. A batch type vacuum deposition method capable of improving sputtering efficiency comprises the following steps: a step for inputting frame(RF) inside a vacuum chamber(S100); a step for forming a base vacuum by a vacuum apparatus(S200); a step for moving a jig and a product by moving the frame(S300); a step for forming a deposition layer on surface of the product moved by the frame(S400); and a step for dissolving a vacuum inside the vacuum chamber(S500).
|
