发明名称 Extreme ultraviolet source with wide angle vapor containment and reflux
摘要 An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.
申请公布号 US7479646(B2) 申请公布日期 2009.01.20
申请号 US20060637205 申请日期 2006.12.11
申请人 PLEX LLC 发明人 MCGEOCH MALCOLM W.
分类号 H05G2/00 主分类号 H05G2/00
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