发明名称 |
POROUS THIN FILM AND THE FABRICATION METHOD THEREOF |
摘要 |
A manufacturing method of a porous thin film is provided to enable the porous thin film to be applied to an SOFC(Solid Oxide Fuel Cell) operated at high temperatures, and to obtain excellent adhesion with a substrate by manufacturing a porous thin film having a porous structure even at high temperatures, and the porous thin film manufactured by the same is provided. A manufacturing method of a porous thin film comprises: depositing reactive gas together with a thin film material using a thin film deposition process to form a thin film; removing the reactive gas from the thin film through heat treatment; and crystallizing the thin film to obtain a porous thin film. The thin film deposition process is one selected from sputtering, vapor deposition, ion plating, and PLD(Pulsed Laser Deposition) methods.
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申请公布号 |
KR20090007168(A) |
申请公布日期 |
2009.01.16 |
申请号 |
KR20070070867 |
申请日期 |
2007.07.13 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, JOO SUN;LEE, HAE WEON;LEE, JONG HO;CHOI, SUN HEE;CHO, TAE SHIN;OH, KEON SEOK |
分类号 |
C23C14/00;C23C14/58 |
主分类号 |
C23C14/00 |
代理机构 |
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