| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition excellent in resolution and having less pattern variation due to SW. <P>SOLUTION: The chemically amplified positive resist composition comprises a radiation-sensitive acid generator represented by formula (I) (wherein R independently represents a hydrogen atom, a linear or branched 1-4C alkyl group which may have a substituent, a linear or branched 1-4C alkoxy group which may have a substituent or a hydroxyl group; n represents an integer of 0-4; and A<SP>+</SP>represents an organic counter cation), and a resin which has a polymerized unit having an acid-labile group, and which is insoluble or slightly soluble in an aqueous alkali solution and becomes soluble in an aqueous alkali solution by the action of an acid. <P>COPYRIGHT: (C)2009,JPO&INPIT |
