| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus of cleaning films deposited on the surfaces of constitutive parts of a treating apparatus. SOLUTION: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including (a) spraying an unintentional coating 106 on the uppermost surface of the chamber part with an acid; (b) pressure spraying the residual coating 106 with deionized water; and (c) treating an intentional coating 104 being an under layer of the coating 106 with potassium hydroxide. Other aspects are provided. COPYRIGHT: (C)2009,JPO&INPIT |
