| 摘要 |
<p>A lithography apparatus including reticle stage and supporting member, and manufacturing method of device are provided to improve lithography accuracy by improving alignment accuracy by vibration reduction. A reticle stage(1) mounts a reticle. A structure(2) supports the reticle stage. A plurality of first supporting members(3) supports the structure. A second supporting member supports the structure, and includes a unit. The unit reduces a vibration of the structure. The second supporting member is arranged in an outside of a region having a boundary which is contacted in a plurality of first supporting members.</p> |
